Buehler , M. G. and G. L. Pearson , 1966 , Solid State Electronics 9 , 395 . Bulthuis , K. , 1968 , Physics Letters 27A , 4 , 193 . ... Clark , A. H. and K. E. Manchester , 1968 , Trans . Met . Soc . A.I.M.E. 242 , 1173 .
The technique of ion implantation has become a very useful and stable technique in the field of semiconductor device fabrication. This use of ion implantation is being adopted by industry....
Realizing this, and having ourselves both contributed to the field, we decided to write a review paper summarizing the experimental and theoretical status of ion implantation into diamond, graphite and related materials.
(1970) Ziegler, J.F., Biersack, J.P., Littmark, U.: The Stopping and Range of Ions in Solids. Per- gamon Press, New York ... Cambridge University Press, Cambridge (1996) Simonton, R., Tasch, A.F.: Channeling effects in ion implantation.
This conference was the fourth in the 1atter series. Twe1ve invited papers and 55 contributed papers covered the areas of ion implantation equipment, measuring techniques, and app1ica tions of implantation to metals and semiconductors.
Ion implantation offers one of the best examples of a topic that starting from the basic research level has reached the high technology level within the framework of microelectronics.
Ion Implantation: Science and Technology serves as both an introduction to and tutorial on the science, techniques, and machines involved in ion implantation. The book is divided into two parts.
The 141 papers (including 24 invited papers) in this volume address the most recent developments in this field. New structures and possible approaches are described.
Ion Implantation Science and Technology: Second Edition, just like the first edition, serves as both an introduction and tutorial to the science, techniques, and machines involved in the subject.
The book further tackles the implantation in gaAs technology and the contacts and interconnections on semiconductors. Engineers and people involved in microelectronics will find the book invaluable.
During the years since the first conference in this series was held at Thousand Oaks, California, in 1970, ion implantation has been an expanding and exciting research area.