Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
- ISBN-10
- 1566771153
- ISBN-13
- 9781566771153
- Category
- Semiconductor wafers
- Pages
- 642
- Language
- English
- Published
- 1996
- Publisher
- The Electrochemical Society
- Authors
- Jerzy Rużyłło, Richard E. Novak
Description
... surface can also have an effect on the density of surface charge . For instance , the surface charge measurements on the surface of chemically cleaned silicon have shown that surface charge varies significantly depending on the cleaning ...
Get the book
Similar books
-
Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 11
By Takeshi Hattori... cleaning times between 1-4 min at high megasonic power led to substantial increase in the k - value . However , a bake ... 10-100 W between 2 and 3 min , in which 10 W / 2 min represents the mildest condition . Subsequent plasma etch of ...
-
Cleaning Technology in Semiconductor Device Manufacturing ...: Proceedings of the International Symposium
By Jerzy RużyłłoCleaning Technology in Semiconductor Device Manufacturing ...: Proceedings of the International Symposium
-
Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
By Jerzy Rużyłło... surface states on metallic removal efficiency , wafers were contaminated by dipping in dilute HF solutions which had ... conditioning in 10 ppb Cu containing 50 : 1 dilute HF solutions for 30 min were measured by a TXRF technique . For ...