Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 10
- ISBN-10
- 156677568X
- ISBN-13
- 9781566775687
- Category
- Microelectronics
- Pages
- 497
- Language
- English
- Published
- 2007
- Publisher
- The Electrochemical Society
- Author
- Takeshi Hattori
Description
This issue covers topics related to the removal of contaminants from and conditioning of Si (SOI), SiC, Ge, SiGe, and III-V semiconductor surfaces; cleaning media, including non-aqueous cleaning methods and tools; front- and back-end cleaning operations; integrated cleaning; cleaning of MEMS; photomasks (reticles); porous low-k dielectrics; post-CMP cleaning; wafer bevel cleaning and polishing; characterization, evaluation, and monitoring of cleaning; correlation with device performance as well as cleaning of equipment and storage and handling hardware. The hardcover edition includes a bonus CD-ROM of Cleaning Technology in Semiconductor Device Manufacturing 1989?2007: Proceedings from the ECS Semiconductor Cleaning Symposia 1?10. This bonus material is not available with the PDF edition.
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